Trainees learn how to operate an EUV lithography system at the ASML training centre in Tainan, Taiwan, August 20, 2020. Photo: Reuters Trainees learn how to operate an EUV lithography system at the ASML training centre in Tainan, Taiwan, August 20, 2020. Photo: Reuters
Trainees learn how to operate an EUV lithography system at the ASML training centre in Tainan, Taiwan, August 20, 2020. Photo: Reuters

China’s semiconductors: Latest US export controls may hinder ambitions to catch up

  • The move extends controls over dual-use tech under the Wassenaar Arrangement, a multilateral export control regime involving 42 countries, including the US and UK
  • Restricted items include lithography software for the fabrication of EUV masks, a technology needed to achieve the advanced 7-nanometre node in chip making

Topic |   Semiconductors
Trainees learn how to operate an EUV lithography system at the ASML training centre in Tainan, Taiwan, August 20, 2020. Photo: Reuters Trainees learn how to operate an EUV lithography system at the ASML training centre in Tainan, Taiwan, August 20, 2020. Photo: Reuters
Trainees learn how to operate an EUV lithography system at the ASML training centre in Tainan, Taiwan, August 20, 2020. Photo: Reuters
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